Archives in Chemical Research Open Access

  • ISSN: 2572-4657
  • Journal h-index: 5
  • Journal CiteScore: 1.16
  • Journal Impact Factor: 1.45
  • Average acceptance to publication time (5-7 days)
  • Average article processing time (30-45 days) Less than 5 volumes 30 days
    8 - 9 volumes 40 days
    10 and more volumes 45 days
Reach us +32 25889658

Fluoride, copper and combined fluoride-copper removals from semiconductor wastewater by electrocoagulation

10th Edition of International Conference on Biofuels and Bioenergy
March 04-05, 2019 Barcelona, Spain

N Drouiche, T Ouslimane and S Aoudj

Indian Institute of Technology Roorkee, Uttar Pradesh, India

Posters & Accepted Abstracts: Arch Chem Res

Abstract:

Treatments of fluoride (F), copper (Cu) and F-Cu from semiconductor-based silicon etching rinse baths by electrocoagulation (EC) using aluminum plate electrodes were investigated in this study. The effects of important process variables such as current intensity, initial pH and initial concentration on the removal efficiencies of F and Cu were evaluated. Removal efficiencies for F and Cu in the single system were found at about 99% at optimum operating conditions.The highest removal efficiencies were achieved at pH 3 for F and between pH 3 and 5 for Cu containing synthetic wastewaters. Experiments were conducted with different F/Cu ratio when Cu concentration was kept constant and F concentration was increased, the highest removal efficiency was observed at lower concentrations. EC study provided high removal efficiencies of F and Cu from semiconductor synthetic wastewater

Biography :

E-mail:

nadjibdrouiche@yahoo.fr